Etching of copper films for thin film transistor liquid crystal display using inductively coupled chlorine-based plasmas

被引：0
|
作者：
机构：
[1] [1,Jang, Kyung Hwan
[2] Lee, Won Jeong
[3] Kim, Hyung Rae
[4] Yeom, Geun Young
来源：
Jang, K.H. | 1600年 / Japan Society of Applied Physics卷 / 43期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Dry etching of BaSrTiO3 and LaNiO3 thin films in inductively coupled plasmas
    Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611, United States
    J Electrochem Soc, 10 (3778-3782):
  • [42] Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas
    Li, Yang
    Wang, Cong
    Yao, Zhao
    Kim, Hong-Ki
    Kim, Nam-Young
    NANOSCALE RESEARCH LETTERS, 2014, 9
  • [43] Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas
    Yang Li
    Cong Wang
    Zhao Yao
    Hong-Ki Kim
    Nam-Young Kim
    Nanoscale Research Letters, 9
  • [44] Nanometer-scale investigation of Al-based alloy films for thin-film transistor liquid crystal display arrays
    Takatsuji, H
    Iiyori, H
    Tsuji, S
    Tsujimoto, K
    Kuroda, K
    Saka, H
    FLAT PANEL DISPLAY MATERIALS III, 1997, 471 : 99 - 104
  • [45] Self-passivated copper as a gate electrode in a poly-Si thin film transistor liquid crystal display
    Chae, GS
    Soh, HS
    Lee, WH
    Lee, JG
    JOURNAL OF APPLIED PHYSICS, 2001, 90 (01) : 411 - 415
  • [46] Polysilicon gate etching in high density plasmas .1. Process optimization using a chlorine-based chemistry
    Bell, FH
    Joubert, O
    Vallier, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 96 - 101
  • [47] The ergonomics approach for thin film transistor-liquid crystal display manufacturing process
    Lu, Chih-Wei
    Yao, Chia-Chun
    Kuo, Chein-Wen
    WORK-A JOURNAL OF PREVENTION ASSESSMENT & REHABILITATION, 2012, 41 : 5627 - 5630
  • [48] Effect of chemical bonds on the properties of SiN in thin film transistor liquid crystal display
    Xie, Zhenyu
    Long, Chunping
    Deng, Chao Yong
    Rim, Seung Moo
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2007, 25 (01): : 191 - 199
  • [49] The utilization of thin film transistor liquid crystal display waste glass as a pozzolanic material
    Lin, K. L.
    Huang, Wu-Jang
    Shie, J. L.
    Lee, T. C.
    Wang, K. S.
    Lee, C. H.
    JOURNAL OF HAZARDOUS MATERIALS, 2009, 163 (2-3) : 916 - 921
  • [50] Amorphous silicon thin film transistor type liquid crystal display with large screen
    Wang, Jingyi
    Weixi Jiagong Jishu/Microfabrication Technology, 1994, (01): : 69 - 72
12345