Etching of copper films for thin film transistor liquid crystal display using inductively coupled chlorine-based plasmas

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[1] [1,Jang, Kyung Hwan
[2] Lee, Won Jeong
[3] Kim, Hyung Rae
[4] Yeom, Geun Young
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Jang, K.H. | 1600年 / Japan Society of Applied Physics卷 / 43期
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