Surface modification of tetrafluoroethylene-hexafluoropropylene (FEP) copolymer by remote H2, N2, O2, and Ar plasmas

被引:0
|
作者
Park, Y.W. [1 ]
Tasaka, S. [1 ]
Inagaki, N. [1 ]
机构
[1] Laboratory of Polymer Chemistry, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu, 432-8561, Japan
来源
Journal of Applied Polymer Science | 1600年 / 83卷 / 06期
关键词
Adhesion - Adhesive joints - Composition effects - Fluorine containing polymers - Gases - Hydrophilicity - Metallizing - Oxidation - Peeling - Plasmas - Surface treatment;
D O I
暂无
中图分类号
学科分类号
摘要
Tetrafluoroethylene-hexafluoropropylene (FEP) copolymer sheets were modified by remote H2, N2, O2, and Ar plasmas, and the effects of the modification on adhesion between FEP sheets and copper metal were investigated. The four plasmas were able to modify the FEP surfaces' hydrophilicity. Defluorination and oxidation reactions on the FEP surfaces occurred with exposure to the plasma. The hydrophilic modification by H2 plasma was best, followed by modification by O2, Ar, and N2 plasmas. The surface modification of FEP by all four remote plasmas was effective in improving adhesion with copper metal. The peel strength order of the FEP/Cu adhesive joints was H2 plasma > Ar plasma > N2 plasma > O2 plasma. Mild surface modification is important for the adhesion improvement of FEP with Cu metal.
引用
收藏
页码:1258 / 1267
相关论文
共 50 条
  • [1] Surface modification of tetrafluoroethylene-hexafluoropropylene (FEP) copolymer by remote H2, N2, O2, and Ar plasmas
    Park, YW
    Tasaka, S
    Inagaki, N
    JOURNAL OF APPLIED POLYMER SCIENCE, 2002, 83 (06) : 1258 - 1267
  • [2] Effects of the surface modification by remote hydrogen plasma on adhesion in the electroless copper/tetrafluoroethylene-hexafluoropropylene copolymer (FEP) system
    Inagaki, N
    Tasaka, S
    Park, YW
    JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1998, 12 (10) : 1105 - 1119
  • [3] Surface modification of poly(vinylidene fluoride) film by remote Ar, H2, and O2 plasmas
    Park, YW
    Inagaki, N
    POLYMER, 2003, 44 (05) : 1569 - 1575
  • [4] Equilibrium composition of H2, O2 and N2 plasmas in thermal disequilibrium
    Koalaga, Z
    CANADIAN JOURNAL OF PHYSICS, 2003, 81 (09) : 1095 - 1108
  • [5] LASER INTERFEROMETRIC STUDY OF DIFFUSION OF O2, N2, H2, AND AR INTO WATER
    OBRIEN, RN
    HYSLOP, WF
    CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1977, 55 (08): : 1415 - 1421
  • [6] Stripping of photoresist using a remote thermal Ar/O2 and Ar/N2/O2 plasma
    Brussaard, GJH
    Letourneur, KGY
    Schaepkens, M
    van de Sanden, MCM
    Schram, DC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (01): : 61 - 66
  • [7] Dispersion of multi-walled carbon nanotube in tetrahydrofuran functionalized with Ar/O2, Ar/N2, and Ar/N2/H2 plasma
    Ogawa, Daisuke
    Kato, Masaki
    Mori, Junki
    Nakamura, Keiji
    SURFACE & COATINGS TECHNOLOGY, 2014, 258 : 605 - 607
  • [8] Modification of Fluorinated Al2O3 Surface by Irradiating H2 and O2 Plasmas
    Miwa, Kazuhiro
    Usami, Kenji
    Takada, Noriharu
    Sasaki, Koichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (12)
  • [9] Modification of fluorinated Al2O3 surface by irradiating H2 and O2 plasmas
    Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-8603, Japan
    不详
    Jpn. J. Appl. Phys., 12
  • [10] Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas
    Zhou, Yingliang
    Li, Hanyang
    Jung, Ji-Eun
    Nam, Sang Ki
    Donnelly, Vincent M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2022, 40 (05):