EMITTANCE CALCULATIONS AND MEASUREMENTS FOR A SPUTTER-TYPE NEGATIVE-ION SOURCE.

被引：0
|
作者：
Billen, James H.
机构：
来源：
Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment | 1984年 / 220卷 / 2-3期
关键词：
ION BEAMS;
D O I：
暂无
中图分类号：
O53 [等离子体物理学]; O57 [原子核物理学、高能物理学];
学科分类号：
070202 ; 070204 ;
摘要：
A method for calculating the beam current and emittance of a negative-ion beam from a sputter-type source is described. In this ion source a Cs** plus beam of up to several mA originates by surface ionization on a hot, high-work-function surface. Cs** plus ions with an energy of a few kev strike the Cs-coated cathode where they produce by sputtering negative ions of the cathode material. The calculation involves tracing trajectories of the Cs** plus ions that bombard the cathode surface and also trajectories of the sputtered negative ions. The dependence of the beam current, emittance and average brightness on several ion source parameters is discussed.
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页码：225 / 250
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