Phase formation and microstructure changes in tantalum thin films induced by bias sputtering

被引：0
|
作者：
Catania, Philippe
Roy, Ronnen A.
Cuomo, Jerome J.
机构：
来源：
Journal of Applied Physics | 1993年 / 74卷 / 02期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] PHASE-FORMATION AND MICROSTRUCTURE CHANGES IN TANTALUM THIN-FILMS INDUCED BY BIAS SPUTTERING
    CATANIA, P
    ROY, RA
    CUOMO, JJ
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (02) : 1008 - 1014
  • [2] SOME PECULIARITIES OF FORMATION OF THIN TANTALUM FILMS PREPARED BY CATHODE SPUTTERING
    UMANSKII, YS
    URAZALIE.US
    IVANOV, RD
    FIZIKA METALLOV I METALLOVEDENIE, 1972, 33 (01): : 196 - &
  • [3] SOME FEATURES OF FORMATION OF THIN-FILMS OF TANTALUM PREPARED BY CATHODE SPUTTERING
    UMANSKIY, YS
    URAZALIY.US
    IVANOV, RD
    PHYSICS OF METALS AND METALLOGRAPHY, 1972, 33 (01): : 186 - 188
  • [4] Synthesis of thin tantalum films by magnetron sputtering
    V. A. Luzanov
    A. S. Vedeneev
    V. V. Ryl’kov
    M. P. Temiryazeva
    A. M. Kozlov
    M. P. Dukhnovskii
    A. S. Bugaev
    Journal of Communications Technology and Electronics, 2015, 60 : 1325 - 1327
  • [5] Synthesis of thin tantalum films by magnetron sputtering
    Luzanov, V. A.
    Vedeneev, A. S.
    Ryl'kov, V. V.
    Temiryazeva, M. P.
    Kozlov, A. M.
    Dukhnovskii, M. P.
    Bugaev, A. S.
    JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS, 2015, 60 (12) : 1325 - 1327
  • [6] ELECTROPHYSICAL PROPERTIES AND PHASE COMPOSITION OF THIN TANTALUM FILMS PREPARED BY CATHODE SPUTTERING
    BELEVSKI.VP
    BELOUS, MV
    YASHNIK, VM
    PERMYAKO.VG
    FIZIKA METALLOV I METALLOVEDENIE, 1972, 33 (03): : 546 - &
  • [7] THIN FILMS DEPOSITED BY BIAS SPUTTERING
    MAISSEL, LI
    SCHAIBLE, PM
    JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) : 237 - &
  • [8] DEPOSITION OF TANTALUM FILMS BY SUBSTRATE-ELECTRODE BIAS SPUTTERING
    VRATNY, F
    SCHWARTZ, N
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1964, 1 (02): : 79 - &
  • [9] FCC tantalum thin films deposited by magnetron sputtering
    Shiri, Sheida
    Odeshi, Akindele
    Chen, Ning
    Feng, Renfei
    Sutarto, Ronny
    Yang, Qiaoqin
    SURFACE & COATINGS TECHNOLOGY, 2019, 358 : 942 - 946
  • [10] TANTALUM SILICIDE THIN-FILMS OBTAINED BY SPUTTERING
    DEMPSEY, J
    DHEURLE, F
    IRENE, E
    PETERSSON, S
    JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 721 - 721
12345