Optical properties of SiNx films prepared by microwave electron cyclotron resonance-chemical vapor deposition (ECR-CVD)

被引：0
|
作者：
Ye, Chao [1 ]
Ning, Zhaoyuan [1 ]
Xiang, Suliu [1 ]
Shen, Mingrong [1 ]
Wang, Hao [1 ]
Gan, Zhaoqiang [1 ]
机构：
[1] Suzhou Univ, Suzhou, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 1997年 / 17卷 / 04期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
引用
收藏
页码：489 / 492
相关论文
共 50 条
  • [1] Intermetal dielectric deposition by electron cyclotron resonance chemical vapor deposition (ECR CVD)
    Tucker, JD
    MICROELECTRONICS JOURNAL, 1995, 26 (08) : R11 - R23
  • [2] Diamond-Like Carbon Thin Films Deposition on Glass Using an Electron Cyclotron Resonance (ECR) Microwave Chemical Vapor Deposition (CVD) System
    Zhang, Guangan
    Wang, Liping
    Yan, Pengxun
    Zhang, Junyan
    ADVANCED TRIBOLOGY, 2009, : 816 - 819
  • [3] Some effects of boron and phosphorus doping on the properties of SiC:H films prepared using electron cyclotron resonance-chemical vapor deposition
    Yoon, SF
    Ji, R
    Ahn, J
    Milne, WI
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (01): : 21 - 28
  • [4] Physical properties of a-C:H films prepared by electron cyclotron resonance microwave plasma chemical vapor deposition
    Zhou, XT
    Lee, ST
    Bello, I
    Cheung, AC
    Chiu, DS
    Lam, YW
    Lee, CS
    Leung, KM
    He, XM
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 77 (03): : 229 - 234
  • [5] Effects of microwave power on the deposition and the properties of ECR-CVD oxides
    Kang, M
    Koo, Y
    An, C
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 34 : S510 - S515
  • [6] Optical and mechanical properties of nanocrystalline aluminum oxynitride films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition
    Xiao, W
    Jiang, X
    JOURNAL OF CRYSTAL GROWTH, 2004, 264 (1-3) : 165 - 171
  • [7] Mechanical properties of DLC films prepared in acetylene and methane plasmas using electron cyclotron resonance microwave plasma chemical vapor deposition
    Lai, KH
    Chan, CY
    Fung, MK
    Bello, I
    Lee, CS
    Lee, ST
    DIAMOND AND RELATED MATERIALS, 2001, 10 (9-10) : 1862 - 1867
  • [8] Hydrogenated amorphous carbon films deposited in an electron cyclotron resonance-chemical vapor deposition discharge reactor using acetylene
    Kim, BK
    Grotjohn, TA
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 654 - 657
  • [9] Effect of unintentionally introduced oxygen on the electron-cyclotron resonance chemical-vapor deposition of SiNX films
    Cova, P
    Masut, RA
    Grenier, O
    Poulin, S
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (01) : 129 - 138
  • [10] Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition
    Zhen-Yu, Wu
    Yin-Tang, Yang
    Jia-You, Wang
    ACTA PHYSICA SINICA, 2006, 55 (05) : 2572 - 2577
12345