SEM proximity effect for poly gate patterns

被引：0
|
作者：
Finders, J. [1 ]
Potoms, G. [1 ]
Ronse, K. [1 ]
Van den Hove, L. [1 ]
Van Driessche, V. [1 ]
Tzviatkov, P. [1 ]
Bruggeman, B. [1 ]
Caligiore, A. [1 ]
机构：
[1] IMEC, Leaven, Belgium
来源：
Microlithography World | / 6卷 / 04期
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页码：5 / 6
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