Electrochemistry of chemical vapor deposited tungsten films with relevance to chemical mechanical polishing

被引：0
|
作者：
Univ of Arizona, Tucson, United States [1 ]
机构：
来源：
J Electrochem Soc | / 12卷 / 4095-4100期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Electrochemistry of chemical vapor deposited tungsten films with relevance to chemical mechanical polishing
    Kneer, EA
    Raghunath, C
    Raghavan, S
    Jeon, JS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (12) : 4095 - 4100
  • [2] Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films
    Yuan, Zewei
    Jin, Zhuji
    Zhang, Youjun
    Wen, Quan
    JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME, 2013, 135 (04):
  • [3] MECHANICAL BEHAVIOR OF CHEMICAL VAPOR-DEPOSITED TUNGSTEN
    CHUN, JS
    SHIM, HS
    BYRNE, JG
    METALLURGICAL TRANSACTIONS, 1972, 3 (12): : 3093 - 3096
  • [4] Tungsten chemical mechanical polishing
    Elbel, N
    Neureither, B
    Ebersberger, B
    Lahnor, P
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (05) : 1659 - 1664
  • [5] Electrochemical polishing of chemical vapor deposited niobium thin films
    Sun, Zeming
    Ge, Mingqi
    Maniscalco, James T.
    Arrieta, Victor
    McNeal, Shawn R.
    Liepe, Matthias U.
    THIN SOLID FILMS, 2023, 780
  • [6] Chemical mechanical polishing of low dielectric constant oxide films deposited using flowfill chemical vapor deposition technology
    Cui, H
    Bhat, IB
    Murarka, SP
    Lu, HQ
    Li, WD
    Hsia, WJ
    Catabay, W
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (10) : 3816 - 3819
  • [7] CHEMICAL VAPOR DEPOSITED TUNGSTEN - MECHANICAL EVALUATION AT HIGH TEMPERATURES
    CHUN, JS
    NICHOLSON, PS
    SOSIN, A
    BYRNE, JG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (09) : 1492 - +
  • [8] CHEMICAL-MECHANICAL POLISHING OF METALORGANIC CHEMICAL-VAPOR-DEPOSITED GOLD FOR LSI INTERCONNECTION
    HOSHINO, M
    SUEHIRO, H
    KASAI, K
    KOMENO, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (3B): : L392 - L394
  • [9] Chemical Mechanical Polishing of Chemical Vapor Deposited Co Films with Minimal Corrosion in the Cu/Co/Mn/SiCOH Patterned Structures
    Sagi, K. V.
    Teugels, L. G.
    van der Veen, M. H.
    Struyf, Herbert
    Alety, S. R.
    Babu, S. V.
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2017, 6 (05) : P276 - P283
  • [10] Electrochemical measurements during the chemical mechanical polishing of tungsten thin films
    Kneer, EA
    Raghunath, C
    Mathew, V
    Raghavan, S
    Jeon, JS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (09) : 3041 - 3049
12345