Nanometer-scale lithography in thin carbon layers using electric field assisted scanning force microscopy

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作者：
Mühl, T. [1 ]
Brückl, H. [1 ]
Weise, G. [1 ]
Reiss, G. [1 ]
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[1] Institute of Solid State and Materials Research Dresden, P.O. Box 27 00 16, D-01171 Dresden, Germany
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| 1997年 / American Institute of Physics Inc.卷 / 82期
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