Thin films of hydrogenated amorphous silicon and polycrystalline silicon; Oxygen and hydrogen interaction effects on electrical properties

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作者：
Aoucher, M. [1 ]
Laïhem, K. [1 ]
机构：
[1] Lab. Couches Minces Semiconducteurs, Inst. Phys., USTHB, BP 32, 16111 B., Alger, Algeria
来源：
Sensors and Actuators, B: Chemical | 1999年 / 59卷 / 02期
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页码：225 / 230
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