Deposition of ultra-thin oxide dielectrics for MOSFETs by a combination of low-temperature plasma-assisted oxidation and intermediate and high-temperature rapid thermal processing

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Lucovsky, G.
Misra, V.
Hattangady, S.V.
Yasuda, T.
Wortman, J.J.
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Journal of Non-Crystalline Solids | 1995年 / 187卷
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