X-ray photoelectron study of the formation of anodic oxide films on aluminum in nitric acid

被引：0
|
作者：
Parkhutik, V.P. [1 ]
Makushok, Yu.E. [1 ]
Kudryavtsev, V.I. [1 ]
Sokol, V.A. [1 ]
Khodan, A.N. [1 ]
机构：
[1] Minsk Radioengineering Inst, Russia
来源：
Soviet electrochemistry | 1988年 / 23卷 / 11期
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摘要：
12
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页码：1439 / 1444
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