Optical detection of interdiffusion in strained Si1-xGex/Si quantum well structures

被引：0
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作者：
Sunamura, Hiroshi [1 ]
Fukatsu, Susumu [1 ]
Usami, Noritaka [1 ]
Shiraki, Yasuhiro [1 ]
机构：
[1] Univ of Tokyo, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 4 B期
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页码：2344 / 2347
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