共 3 条
- [1] 160 MPX/SEC LASER PATTERN GENERATOR FOR MASK AND RETICLE PRODUCTION PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 470 : 212 - 220
- [2] Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI, 2004, 5446 : 632 - 642
- [3] Properties of a 248-mn DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes 23RD ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2003, 5256 : 684 - 694