Specific features induced by the vaporation of solid organometallic compounds used as OMCVD precursors for deposition in the V-C-N chemical system

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作者：
Teyssandier, F.
Poirier, L.
Slifirski, J.
Valade, L.
Danjoy, C.
Reynes, A.
Jauberteau, J.L.
Sibieude, F.
机构：
[1] Inst. Sci. Genie Mat. et Procedes, CNRS-UPR8521, 52 Avenue de Villeneuve, 66860 Perpignan Cedex, France
[2] GIAT-industries, CRET, 7, Route de Guerry, 18023 Bourges Cedex, France
[3] Lab. de Chimie de Coordination, CNRS-UPR8241, 205 Route de Narbonne, 31077 Toulouse Cedex, France
[4] Cristallochimie, Reactiv. et Protect. des Mat., CNRS-ESA5071, 118 Route de Narbonne, 31077 Toulouse Cedex, France
[5] Fac. des Sciences de Limoges, Lab. Mat. Ceramiques Traitement S., CNRS-URA320, 123 Avenue A. Thomas, 87060 Limoges, France
[6] Inst. Sci. Genie Mat. et Procedes, CNRS-UPR8521, 66125 Font-Romeu, France
[7] IMP-CNRS-UPR8521, Université, 66860 Perpignan, France
来源：
Annales de Chimie: Science des Materiaux | / 23卷 / 5-6期
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页码：655 / 666
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