Reduction imaging at 4.5 nm with Schwarzschild optics

被引:0
|
作者
机构
[1] Nagata, Hiroshi
[2] Ohtani, Masayuki
[3] Murakami, Katsuhiko
[4] Oizumi, Hiroaki
[5] Yamashita, Yoshio
[6] Atoda, Nobufumi
来源
Nagata, Hiroshi | 1600年 / JJAP, Minato-ku, Japan卷 / 33期
关键词
Imaging systems;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] REDUCTION IMAGING AT 4.5 NM WITH SCHWARZSCHILD OPTICS
    NAGATA, H
    OHTANI, M
    MURAKAMI, K
    OIZUMI, H
    YAMASHITA, Y
    ATODA, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (8B): : L1192 - L1194
  • [2] X-ray Schwarzschild objective for the carbon window, (λ ∼ 4.5 nm)
    Artyukov, Igor
    Bugayev, Yegor
    Devizenko, Olexander
    Gullikson, Eric
    Kondratenko, Valeriy
    Vinogradov, Alexander
    OPTICS LETTERS, 2009, 34 (19) : 2930 - 2932
  • [3] 13.5 nm Schwarzschild microscope and imaging experiment
    Wang X.
    Mu B.-Z.
    Huang Y.
    Zhu J.-T.
    Wang Z.-S.
    He P.-F.
    Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2011, 19 (08): : 1709 - 1715
  • [4] Optics in the Schwarzschild spacetime
    Cadez, A
    Kostic, U
    PHYSICAL REVIEW D, 2005, 72 (10):
  • [5] Fabrication and metrology of 10X Schwarzschild optics for EUV imaging
    Marchetti, L
    ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS, 2004, 5193 : 1 - 10
  • [6] SOFT-X-RAY PROJECTION LITHOGRAPHY EXPERIMENTS USING SCHWARZSCHILD IMAGING OPTICS
    TICHENOR, DA
    KUBIAK, GD
    MALINOWSKI, ME
    STULEN, RH
    HANEY, SJ
    BERGER, KW
    BROWN, LA
    SWEATT, WC
    BJORKHOLM, JE
    FREEMAN, RR
    HIMEL, MD
    MACDOWELL, AA
    TENNANT, DM
    WOOD, OR
    BOKOR, J
    JEWELL, TE
    MANSFIELD, WM
    WASKIEWICZ, WK
    WHITE, DL
    WINDT, DL
    APPLIED OPTICS, 1993, 32 (34): : 7068 - 7071
  • [7] A soft-X-ray imaging microscope with multilayer-coated Schwarzschild optics
    Toyoda, M
    Shitani, Y
    Yanagihara, M
    Ejima, T
    Yamamoto, M
    Watanabe, M
    X-RAY MICROSCOPY, PROCEEDINGS, 2000, 507 : 363 - 366
  • [8] At-wavelength metrology of 13 nm lithography imaging optics
    Tan, Zhengquan
    MacDowell, A.A.
    La Fontaine, B.
    Bjorkholm, J.E.
    Tennant, D.
    Taylor, D.
    Himel, M.
    Freeman, R.R.
    Waskiewicz, W.K.
    Windt, D.L.
    Spector, S.
    Ray-Chaudhuri, A.K.
    Stulen, R.H.
    Ng, W.
    Cerrina, F.
    Review of Scientific Instruments, 1995, 66 (2 pt 2): : 2241 - 2243
  • [9] Analytical design method for a modified Schwarzschild optics
    Budano, Antonio
    Flora, Francesco
    Mezi, Luca
    APPLIED OPTICS, 2006, 45 (18) : 4254 - 4262
  • [10] AT-WAVELENGTH METROLOGY OF 13-NM LITHOGRAPHY IMAGING OPTICS
    TAN, ZQ
    MACDOWELL, AA
    LAFONTAINE, B
    BJORKHOLM, JE
    TENNANT, D
    TAYLOR, D
    HIMEL, M
    FREEMAN, RR
    WASKIEWICZ, WK
    WINDT, DL
    SPECTOR, S
    RAYCHAUDHURI, AK
    STULEN, RH
    NG, W
    CERRINA, F
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (02): : 2241 - 2243