Study of a low voltage electrostatic electron beam probe system

被引：0
|
作者：
Tang, T.T. [1 ]
Yan, C. [1 ]
Wang, H. [1 ]
机构：
[1] Xian Jiatong Univ, China
来源：
Microelectronic Engineering | 1989年 / 9卷 / 1-4期
关键词：
Electron Beams--Applications - Electrostatic Lenses--Optimization - Integrated Circuit Testing;
D O I：
10.1016/0167-9317(89)90093-2
中图分类号：
学科分类号：
摘要：
Parameter optimization methods of low aberration electrostatic lenses and combined electrostatic focusing-deflection systems were investigated and a low voltage electrostatic optical system was designed to realize a submicron EB probe. A beam spot size of 0.05-0.1um with a beam current of 50-200nA and with a large scanning field at lkV can be obtained after dynamic correction of deflection aberrations. The calculated results agree with the experimental ones.
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页码：429 / 432
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