Encapsulation of chemically sensitive field-effect transistors with photocurable epoxy resins

被引：0

|

作者：

Dumschat, C. ^{[1
]}

Mueller, H. ^{[1
]}

Rautschek, H. ^{[1
]}

Timpe, H.-J. ^{[1
]}

Hoffmann, W. ^{[1
]}

Pham, M.T. ^{[1
]}

Hueller, J. ^{[1
]}

机构：

[1] Technical Univ 'Carl Schorlemmer', Leuna-Merseburg, Merseburg, Germany

来源：

Sensors and Actuators, B: Chemical | 1990年 / B2卷 / 04期

关键词：

Photocurable Epoxies - Photolithographic Structuring;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

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页码：271 / 276

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