Optimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by the experimental design method

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作者：
Carpi, Enio L. [1 ]
Van Hove, M. [1 ]
Alay, J.L. [1 ]
Van Rossum, M. [1 ]
机构：
[1] Interuniversity Microelectronics, Cent, Leuven, Belgium
来源：
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 1995年 / 13卷 / 03期
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页码：895 / 901
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