Interfacial reaction and electrical properties in the sputter-deposited Al/Ti ohmic contact to n-InP

被引：0
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作者：
Takeyama, Mayumi B. [2 ]
Noya, Atsushi [2 ]
Hashizume, Tamotsu [1 ,2 ]
Hasegawa, Hideki [1 ,2 ]
机构：
[1] Res. Ctr. for Interface Quant. E., Grad. Sch. Electronics and Inf. Eng., Hokkaido University, Sapporo 060-8628, Japan
[2] Dept. of Elec. and Electron. Eng., Faculty of Engineering, Kitami Institute of Technology, Kitami 090-8507, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 2 B期
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页码：1115 / 1118
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