CVD of boron carbide as coating and matrix material

被引:0
|
作者
Dariel, M.S. [1 ]
Agam, S. [1 ]
Kimmel, G. [1 ]
Leibovits, O. [1 ]
Edelstein, D. [1 ]
Barkay, Z. [1 ]
机构
[1] Nuclear Research Cent-Negev, Israel
来源
Israel Journal of Technology | 1988年 / 24卷 / 3 -4,Pt B期
关键词
Nuclear Reactors; Fusion--Containment Vessels - Propylene - Tokamak Devices;
D O I
暂无
中图分类号
学科分类号
摘要
The authors have investigated the use of propylene as the carbon bearing component to deposit fully dense boron carbide on reinforcing fibers at temperatures lower than 1200°C and at relatively high (atmospheric) pressure. Substrates were polished graphite samples or SiC and graphite fiber preforms. Boron carbide formed by CVD was deposited as coatings of hardness >4000 kg/mm2. Amorphous material was obtained at 950°C. Under conditions of high saturation of the gas phase the deposition kinetics remain surface reaction controlled up to a temperature of 1150°C, when material having strong preferred orientation, with plane 110 parallel to the surface, is formed. The coatings are strongly conformal to the surface, penetrating into pores of graphite substrates and infiltrating voids between reinforcing fibers of SiC or carbon.
引用
收藏
页码:511 / 516
相关论文
共 50 条
  • [1] THERMOELECTRIC PROPERTIES OF CVD BORON-CARBIDE
    KOUMOTO, K
    AMERICAN CERAMIC SOCIETY BULLETIN, 1994, 73 (10): : 84 - 87
  • [2] Plasma spray boron carbide coating
    Zeng, Y
    Zhang, YF
    Huang, JQ
    Xia, JY
    Ding, CX
    JOURNAL OF INORGANIC MATERIALS, 1998, 13 (06) : 918 - 922
  • [3] Sand erosion performance of CVD boron carbide coated tungsten carbide
    Wood, RJK
    Wheeler, DW
    Lejeau, DC
    Mellor, BG
    WEAR, 1999, 233 : 134 - 150
  • [4] Deposition of CVD diamond onto boron carbide substrates
    May, PW
    Rosser, KN
    Fox, NA
    Younes, CM
    Beardmore, G
    DIAMOND AND RELATED MATERIALS, 1997, 6 (2-4) : 450 - 455
  • [5] CVD SYNTHESIS AND THERMOELECTRIC PROPERTIES OF BORON-CARBIDE
    KOUMOTO, K
    SEKI, T
    PAI, CH
    YANAGIDA, H
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1992, 100 (06): : 853 - 857
  • [6] CONTINUOUS CVD PROCESS FOR COATING FILAMENTS WITH TANTALUM CARBIDE
    HEFFERNA.WJ
    AHMAD, I
    HASKELL, RW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) : C248 - C248
  • [7] Silicon carbide coating of mullite substrates by the CVD technique
    Regiani, I
    de Souza, MF
    SURFACE & COATINGS TECHNOLOGY, 2003, 162 (2-3): : 131 - 134
  • [8] BORON CARBIDE AS A BASE MATERIAL FOR A CERMET
    HAMJIAN, HJ
    LIDMAN, WG
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1952, 35 (02) : 44 - 48
  • [9] Study on plasma sprayed boron carbide coating
    Yi Zeng
    Soo W. Lee
    Chuanxian Ding
    Journal of Thermal Spray Technology, 2002, 11 : 129 - 133
  • [10] Abrasiveness Variation in a Thin Boron Carbide Coating
    Matthew T. Siniawski
    Stephen J. Harris
    Qian Wang
    Tribology Letters, 2003, 15 : 359 - 364