Nondestructive test methodology for molecular beam epitaxy grown pseudomorphic high electron mobility transistor materials

被引:0
|
作者
机构
来源
J Vac Sci Technol B | / 3卷 / 2240期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Nondestructive test methodology for molecular beam epitaxy grown pseudomorphic high electron mobility transistor materials
    Pao, YC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 2240 - 2243
  • [2] Pseudomorphic InxGa1-xAs/InyAl1-yAs high electron mobility transistor structures grown by solid source molecular beam epitaxy
    Zheng, HQ
    Radahakrishnan, K
    Yoon, SF
    Ng, GI
    ADVANCED MICROELECTRONIC PROCESSING TECHNIQUES, 2000, 4227 : 25 - 28
  • [3] InAlAs/InGaAs Pseudomorphic High Eelectron Mobility Transistors Grown by Molecular Beam Epitaxy on the InP Substrate
    Huang Jie
    Guo Tian-Yi
    Zhang Hai-Ying
    Xu Jing-Bo
    Fu Xiao-Jun
    Yang Hao
    Niu Jie-Bin
    CHINESE PHYSICS LETTERS, 2010, 27 (11)
  • [4] High electron mobility in Ga(In)NAs films grown by molecular beam epitaxy
    Miyashita, Naoya
    Ahsan, Nazmul
    Inagaki, Makoto
    Islam, Muhammad Monirul
    Yamaguchi, Masafumi
    Okada, Yoshitaka
    APPLIED PHYSICS LETTERS, 2012, 101 (22)
  • [5] High electron mobility InP grown by solid source molecular beam epitaxy
    Wang, Hongzhen
    Zhu, Yicheng
    Gu, Yi
    Chen, Pingping
    Wang, Wei
    Chen, Xiren
    Yang, Bo
    Li, Tao
    Shao, Xiumei
    Li, Xue
    Gong, Haimei
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2020, 112 (112)
  • [6] Electron mobility characteristics of InxGa1-xAs/InAlAs/InP high electron mobility transistor (HEMT) structures grown by molecular beam epitaxy
    Roh, DW
    Lee, HG
    Lee, JJ
    JOURNAL OF CRYSTAL GROWTH, 1996, 167 (3-4) : 468 - 472
  • [7] Electron mobility characteristics of InxGa1-xAs/InAlAs/InP high electron mobility transistor (HEMT) structures grown by molecular beam epitaxy
    Electronics and Telecommunications, Research Inst, Taejon, Korea, Republic of
    J Cryst Growth, 3-4 (468-472):
  • [8] AlGaN/GaN high electron mobility transistor heterostructures grown by ammonia and combined plasma-assisted ammonia molecular beam epitaxy
    Alyamani, Ahmed
    Lutsenko, Evgenii V.
    Rzheutski, Mikalai V.
    Zubialevich, Vitaly Z.
    Vainilovich, Aliaksei G.
    Svitsiankou, Illia E.
    Shulenkova, Varvara A.
    Yablonskii, Gennadii P.
    Petrov, Stanislav I.
    Alexeev, Alexey N.
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2019, 58 (SC)
  • [9] AlGaN/GaN high electron mobility transistor grown by molecular beam epitaxy on Si(110): comparisons with Si(111) and Si(001)
    Cordier, Y.
    Moreno, J. -C.
    Baron, N.
    Frayssinet, E.
    Chenot, S.
    Damilano, B.
    Semond, F.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 2, 2009, 6 : S1020 - S1023
  • [10] Fabrication and characteristics of In0.48Ga0.52P/In0.20Ga0.80As/GaAs pseudomorphic high electron mobility transistor grown by solid-source molecular beam epitaxy
    Yoon, SF
    Gay, BP
    Zheng, HQ
    Ang, KS
    Wang, H
    Ng, GI
    MICROELECTRONICS JOURNAL, 1999, 30 (01) : 23 - 28