Studies of SiO2 films deposited by RF magnetron sputtering

被引：0
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作者：
Liu, Yanhong [1 ]
Guo, Baohai [1 ]
Ma, Tengcai [1 ]
机构：
[1] Dalian Univ of Technol., China
来源：
Dalian Ligong Daxue Xuebao/Journal of Dalian University of Technology | 1997年 / 37卷 / 02期
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页码：204 / 207
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