Simulation method for buried oxide formation of separation by implanted oxygen structure during post-implantation thermal annealing

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作者：
Nakao, Motoi [1 ]
Sudoh, Koichi [2 ]
Iikawa, Hirofumi [1 ]
Iwasaki, Hiroshi [2 ]
Izumi, Katsutoshi [1 ]
机构：
[1] Research Institute for Advanced Science and Technology, Osaka Prefecture University, 1-2 Gakuencho, Sakai, Osaka 599-8570, Japan
[2] Institute of Science and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2005年 / 44卷 / 4 B期
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页码：2380 / 2384
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