Sensor systems for real-time feedback control of reactive ion etching

被引:0
|
作者
机构
来源
J Vac Sci Technol B | / 1卷 / 483期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Sensor systems for real-time feedback control of reactive ion etching
    Benson, TE
    Kamlet, LI
    Ruegsegger, SM
    Hanish, CK
    Hanish, PD
    Rashap, BA
    Klimecky, P
    Freudenberg, JS
    Grizzle, JW
    Khargonekar, PP
    Terry, FL
    Barney, B
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 483 - 488
  • [2] Real-time feedback for sidewall profile control in reactive ion etching
    Rashap, B.
    Freudenberg, J.
    Elta, M.
    [J]. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1995, 13 (03): : 1792 - 1796
  • [3] REAL-TIME FEEDBACK FOR SIDEWALL PROFILE CONTROL IN REACTIVE ION ETCHING
    RASHAP, B
    FREUDENBERG, J
    ELTA, M
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 1792 - 1796
  • [4] Real-time feedback control of reactive ion etching using neural networks
    Kim, T
    Stokes, D
    May, G
    [J]. ICNN - 1996 IEEE INTERNATIONAL CONFERENCE ON NEURAL NETWORKS, VOLS. 1-4, 1996, : 2039 - 2043
  • [5] Real-time control of reactive ion etching using neural networks
    Stokes, D
    May, G
    [J]. PROCEEDINGS OF THE 1997 AMERICAN CONTROL CONFERENCE, VOLS 1-6, 1997, : 1575 - 1578
  • [6] Real-time control of reactive ion etching using neural networks
    Stokes, D
    May, GS
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2000, 13 (04) : 469 - 480
  • [7] CONTROL OF SEMICONDUCTOR MANUFACTURING EQUIPMENT - REAL-TIME FEEDBACK-CONTROL OF A REACTIVE ION ETCHER
    RASHAP, BA
    ELTA, ME
    ETEMAD, H
    FOURNIER, JP
    FREUDENBERG, JS
    GILES, MD
    GRIZZLE, JW
    KABAMBA, PT
    KHARGONEKAR, PP
    LAFORTUNE, S
    MOYNE, JR
    TENEKETZIS, D
    TERRY, FL
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1995, 8 (03) : 286 - 297
  • [8] Integrated real-time and run-to-run control of etch depth in reactive ion etching
    Hankinson, M
    Vincent, T
    Irani, KB
    Khargonekar, PP
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1997, 10 (01) : 121 - 130
  • [9] Empirical modelling of reactive ion etching for reduction of variance via robust design, real-time feedback and run-to-run control
    Patterson, OD
    Khargonekar, PP
    Grimard, DS
    Dong, X
    Nair, VN
    [J]. PROCEEDINGS OF THE SECOND INTERNATIONAL SYMPOSIUM ON PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANUFACTURING, 1997, 97 (09): : 45 - 54
  • [10] Reduction of loading effect in reactive ion etching using real-time closed-loop control
    Patterson, OD
    Khargonekar, PP
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (08) : 2865 - 2871