Flatness Measurements in Semiconductor Technology.

被引：0

作者：

Jaerisch, W.

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来源：

F and M; Feinwerktechnik, Mikrotechnik, Messtechnik | 1975年 / 83卷 / 05期

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摘要：

Precise geometry measurements have to be made over and over again during the course of manufacture of a silicon wafer. The author refers to such measurements and their importance at the various stages of production of a wafer. The applicability of commonly known flatness measuring methods for semiconductor technology is discussed.

引用

页码：199 / 208

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