Processing conditions for boron nitride coatings in fiber bundles via chemical vapor deposition

被引：0
|
作者：
Einset, Erik O. [1 ]
Patibandla, Nag-Bhushan [1 ]
Luthra, Krishan L. [1 ]
机构：
[1] General Electric Corporate Research, and Development, Schenectady, United States
来源：
| 1600年 / American Ceramic Soc, Westerville, OH, United States卷 / 77期
关键词：
Ceramic coatings;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] PROCESSING CONDITIONS FOR BORON-NITRIDE COATINGS IN FIBER-BUNDLES VIA CHEMICAL-VAPOR-DEPOSITION
    EINSET, EO
    PATIBANDLA, NB
    LUTHRA, KL
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (12) : 3081 - 3086
  • [2] Straightforward Deposition of Uniform Boron Nitride Coatings by Chemical Vapor Deposition
    José E. Nocua
    Gerardo Morell
    [J]. MRS Advances, 2018, 3 (4) : 191 - 197
  • [3] Straightforward Deposition of Uniform Boron Nitride Coatings by Chemical Vapor Deposition
    Nocua, Jose E.
    Morell, Gerardo
    [J]. MRS ADVANCES, 2018, 3 (04): : 191 - 197
  • [4] Chemical vapor deposition of boron nitride coatings on moving fibers
    Joh, S
    Evans, GH
    [J]. PROCEEDINGS OF THE THIRTEENTH INTERNATIONAL CONFERENCE ON CHEMICAL VAPOR DEPOSITION, 1996, 96 (05): : 588 - 593
  • [5] Boron nitride coatings by chemical vapor deposition from borazine
    Li, Jun-Sheng
    Zhang, Chang-Rui
    Li, Bin
    Cao, Feng
    Wang, Si-Qing
    [J]. SURFACE & COATINGS TECHNOLOGY, 2011, 205 (12): : 3736 - 3741
  • [6] The synthesis of hexagonal boron nitride via chemical vapor deposition
    Yang Y.
    Wu B.
    Wang L.
    Liu Y.
    [J]. Kexue Tongbao/Chinese Science Bulletin, 2017, 62 (20): : 2195 - 2207
  • [7] Influence of isothermal chemical vapor deposition and chemical vapor infiltration conditions on the deposition kinetics and structure of boron nitride
    Leparoux, M
    Vandenbulcke, L
    Clinard, C
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1999, 82 (05) : 1187 - 1195
  • [8] Chemical Vapor Deposition of Hexagonal Boron Nitride
    Suzukit, Satoru
    Hibino, Hiroki
    [J]. E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2012, 10 : 133 - 138
  • [9] Effect of Processing Parameters on the Microstructure of Silicon Nitride Coatings by Chemical Vapor Deposition
    Li, Jialiang
    Chen, Fei
    Niu, Jinye
    Jiang, Hongyi
    [J]. ADVANCED SYNTHESIS AND PROCESSING TECHNOLOGY FOR MATERIALS, 2009, 66 : 175 - +
  • [10] CHEMICAL VAPOR-DEPOSITION OF VERY THIN COATINGS ON CARBON-FIBER BUNDLES
    STUMM, T
    FITZER, E
    WAHL, G
    [J]. JOURNAL DE PHYSIQUE III, 1992, 2 (08): : 1413 - 1420
12345