Mask membrane distortions due to pattern transfer for electron-beam lithography (SCALPEL) masks

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Computational Mechanics Center, University of Wisconsin-Madison, 1513 University Avenue, Madison, WI 53706, United States [1 ]
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Microelectron Eng | / 1卷 / 259-262期
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Number:; -; Acronym:; SRC; Sponsor: Semiconductor Research Corporation;
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