Liquid-target laser-plasma source for x-ray lithography

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作者：
Lund Inst of Technology, Lund, Sweden [1 ]
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Microelectron Eng | / 1-4卷 / 535-536期
关键词：
Aluminum - Copper - Electric filters - Fluorocarbons - Gold - Laser produced plasmas - Laser pulses - Masks - Nozzles - Plasma sources - Silicon nitride;
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摘要：
We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness λ=1.2-1.7 nm x-ray emission with approx.5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.
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