Depth Profiling of Si Oxidation States in Si-Implanted SiO2 Films by X-Ray Photoelectron Spectroscopy

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[1] Liu, Yang
[2] Fu, Yong Qing
[3] Chen, Tu Pei
[4] Tse, Man Siu
[5] Fung, Steve
[6] Hsieh, Jang-Hsing
[7] Yang, Xiao Hong
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Liu, Y. | 1600年 / Japan Society of Applied Physics卷 / 42期
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