Fullerene-like B-C-N thin films: A computational and experimental study

被引：0
|
作者：
Hellgren, Niklas [1 ,2 ]
Berlind, Torun [1 ]
Gueorguiev, Gueorgui K. [1 ]
Johansson, Mats P. [1 ]
Stafström, Sven [1 ]
Hultman, Lars [1 ]
机构：
[1] Department of Physics, IFM, Linköping University, S-58 183 Linköping, Sweden
[2] Intel Corporation, Portland Technology Development, RA3-301, 5200 NE Elam Young Parkway, Hillsboro, OR 97124, United States
来源：
Materials Science and Engineering: B | 2004年 / 113卷 / 03期
关键词：
Nanoindentation - Reactive magnetron sputtering - Substrate temperatures;
D O I：
10.1016/S0921-5107(04)00430-1
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：242 / 247
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