Diffusion coefficient of interstitial iron in silicon

被引：0
|
作者：
机构：
[1] Isobe, Takashi
[2] Nakashima, Hiroshi
[3] Hashimoto, Kimio
来源：
Isobe, Takashi | 1600年 / 28期
关键词：
Semiconducting Silicon;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] DIFFUSION-COEFFICIENT OF INTERSTITIAL IRON IN SILICON
    ISOBE, T
    NAKASHIMA, H
    HASHIMOTO, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (07): : 1282 - 1283
  • [2] Intrinsic diffusion coefficient of interstitial copper in silicon
    Istratov, AA
    Flink, C
    Hieslmair, H
    Weber, ER
    Heiser, T
    PHYSICAL REVIEW LETTERS, 1998, 81 (06) : 1243 - 1246
  • [3] THE DIFFUSION-COEFFICIENT OF INTERSTITIAL CARBON IN SILICON
    TIPPING, AK
    NEWMAN, RC
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1987, 2 (05) : 315 - 317
  • [4] Diffusion coefficient of iron in silicon at room temperature
    Nakashima, Hiroshi
    Isobe, Takashi
    Yamamoto, Yuhide
    Hashimoto, Kimio
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1988, 27 (08): : 1542 - 1543
  • [5] DIFFUSION-COEFFICIENT OF IRON IN SILICON AT ROOM-TEMPERATURE
    NAKASHIMA, H
    ISOBE, T
    YAMAMOTO, Y
    HASHIMOTO, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1988, 27 (08): : 1542 - 1543
  • [6] Influence of dislocation strain fields on the diffusion of interstitial iron impurities in silicon
    Ziebarth, Benedikt
    Mrovec, Matous
    Elsaesser, Christian
    Gumbsch, Peter
    PHYSICAL REVIEW B, 2015, 92 (11)
  • [7] THE DIFFUSION COEFFICIENT OF HYDROGEN IN IRON
    STROSS, TM
    TOMPKINS, FC
    JOURNAL OF THE CHEMICAL SOCIETY, 1956, (FEB): : 230 - 234
  • [8] DIFFUSION OF SILICON IN IRON
    BATZ, W
    MEAD, HW
    BIRCHENALL, CE
    TRANSACTIONS OF THE AMERICAN INSTITUTE OF MINING AND METALLURGICAL ENGINEERS, 1952, 194 (10): : 1070 - 1070
  • [9] THE DIFFUSION OF IRON IN SILICON
    KIMERLING, LC
    GILMER, GH
    BENTON, JL
    JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (07) : 37 - 37
  • [10] DIFFUSION OF SILICON IN IRON
    BATZ, W
    MEAD, HW
    BIRCHENALL, CE
    JOURNAL OF METALS, 1952, 4 (10): : 1070 - 1070
12345