Nucleation and growth mechanisms of Si-N-O fibres

被引：0
|
作者：
Ewing, H. [1 ,2 ]
Vital, A. [1 ,3 ]
Vogt, U. [1 ]
Hendry, A. [2 ]
机构：
[1] Swiss Fed. Labs. Mat. Test. and Res., Dübendorf, Switzerland
[2] University of Strathclyde, Dept. of Mechanical Engineering, Glasgow, United Kingdom
[3] Swiss Fed. Institute of Technology, Dept. of Process Engineering, Zürich, Switzerland
来源：
Materials Science Forum | 2000年 / 325卷
关键词：
Silicon oxynitride fibres;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：37 / 42
相关论文
共 50 条
  • [1] The nucleation and growth mechanisms of Si-N-O fibres
    Ewing, H
    Vital, A
    Vogt, U
    Hendry, A
    NITRIDES AND OXYNITRIDES, 2000, 325-3 : 37 - 42
  • [2] THERMODYNAMIC CALCULATION OF THE SI-N-O SYSTEM
    HILLERT, M
    JONSSON, S
    SUNDMAN, B
    ZEITSCHRIFT FUR METALLKUNDE, 1992, 83 (09): : 648 - 654
  • [3] High-performance Si-N-O fibres: Pilot-scale production, characterisation and applications
    Vital, A
    Vogt, U
    EURO CERAMICS VII, PT 1-3, 2002, 206-2 : 1173 - 1176
  • [4] SHS in the Si-N-O System Containing Iron Salts
    Barinova, T. V.
    Kovalev, D. Yu.
    Konovalikhin, S. V.
    INTERNATIONAL JOURNAL OF SELF-PROPAGATING HIGH-TEMPERATURE SYNTHESIS, 2021, 30 (02) : 65 - 72
  • [5] In-situ FTIR spectroscopic monitoring of a CVD controlled Si-N-O fibre growth process
    Vogt, U
    Vital, A
    Graehlert, W
    Leparoux, M
    Ewing, H
    Beil, A
    Daum, R
    Hopfe, V
    JOURNAL DE PHYSIQUE IV, 2000, 10 (P2): : 43 - 48
  • [6] Optimization and scale-up of Si-N-O fiber synthesis
    Swiss Federal Lab for Materials, Testing and Research , Duebendorf, Switzerland
    Ceram Eng Sci Proc, 4 (411-418):
  • [7] THERMODYNAMICS OF THE SI-N-O SYSTEM AND KINETIC MODELING OF OXIDATION OF SI3N4
    DU, HH
    TRESSLER, RE
    SPEAR, KE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (11) : 3210 - 3215
  • [8] Manufacturing and high temperature mechanical properties of Si-N-O ceramic fibers
    Sato, M
    Okamura, K
    JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1998, 106 (03) : 248 - 255
  • [9] Electrodeposition of CdTe thin films onto n-Si(100):: nucleation and growth mechanisms
    Gómez, H
    Henríquez, R
    Schrebler, R
    Córdova, R
    Ramírez, D
    Riveros, G
    Dalchiele, EA
    ELECTROCHIMICA ACTA, 2005, 50 (06) : 1299 - 1305
  • [10] STRUCTURAL ORDER IN SI-N AND SI-N-O FILMS PREPARED BY PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION PROCESS
    BUDHANI, RC
    PRAKASH, S
    DOERR, HJ
    BUNSHAH, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 1644 - 1648
12345