PERFORMANCE OF PLATINUM-CLAD TANTALUM ANODES IN ELECTROPLATING.

被引：0
|
作者：
Skomoroski, R.M.
Baboian, R.
Zobbi, R.G.
Camp, E.K.
机构：
来源：
Plating | 1973年 / 60卷 / 11期
关键词：
ELECTROLYTES - PLATINUM AND ALLOYS;
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摘要：
Until recently, the minimum thickness of platinum used on such anodes was 6. 4 mu m. However, various developments in metal technology have been used to prepare platinum-clad tantalum anodes containing only 3. 2 mu m of platinum. Comparative use tests with both types of platinum-clad tantalum in Au, Rh, Ru, and Pd electroplating baths have shown that their performance is similar.
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页码：1115 / 1119
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