Electronic structure of the (001) surface of the intermetallic compound Ni3Al is calculated by self-consistent film linear augmented plane-wave method. The surface states above and below Fermi level were found. The most portion of occupied surface states are generated by the surface atoms of nickel. There is an occupied state at the M point localized on the surface atoms of aluminium. Many unoccupied states are localized on the aluminium atoms of the surface layer. Calculated value of the work function is higher then that of the Ni(001) and Al(001) surfaces.