DEUTERIUM RETENTION IN Ti1 - xBx FILMS DEPOSITED ONTO MOLYBDENUM BY CO-SPUTTERING METHOD.

被引：0

作者：

Shikama, T. ^{[1
]}

Noda, T. ^{[1
]}

Fukutomi, M. ^{[1
]}

Okada, M. ^{[1
]}

机构：

[1] Natl Research Inst for Metals, Sakura-mura, Jpn, Natl Research Inst for Metals, Sakura-mura, Jpn

来源：

Journal of Nuclear Materials | 1986年 / 141-143卷 / pt A期

关键词：

MOLYBDENUM AND ALLOYS - Protective Coatings;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Titanium diboride (TiB//2) is a candidate for first wall coatings in fusion devices. The coatings were irradiated by 6 keV D//3** plus to doses of 0. 1-0. 7 Coulomb at room temperature and heated to about 1150 K with a temperature rise rate of 10 K/min. Desorption profiles and the amount of retention of irradiated deuterium were measured. The retention behavior depends on chemical composition of the films. The degree of crystallization also affected retention.

引用

页码：156 / 159

共 50 条

[1] DEUTERIUM RETENTION IN TI1-XBX FILMS DEPOSITED ONTO MOLYBDENUM BY COSPUTTERING METHOD
SHIKAMA, T
NODA, T
FUKUTOMI, M
OKADA, M
JOURNAL OF NUCLEAR MATERIALS, 1986, 141 : 156 - 159
[2] CHARACTERIZATION OF TI1-XBX FILMS DEPOSITED BY A CO-SPUTTERING METHOD
SHIKAMA, T
SAKAI, Y
FUJITSUKA, M
YAMAUCHI, Y
SHINNO, H
OKADA, M
THIN SOLID FILMS, 1988, 164 : 95 - 101
[3] RESISTANCE AGAINST OXIDATION OF Ti1 - xAlxN FILMS PREPARED BY RF-SPUTTERING METHOD.
Inamura, Suguru
Takahashi, Masao
Nobugai, Kohji
Kanamaru, Fumikazu
Miyamoto, Hiroki
Zairyo/Journal of the Society of Materials Science, Japan, 1988, 37 (412) : 83 - 86
[4] SPUTTERING YIELD OF TI1-XBX FILMS BY 2 KEV DEUTERIUM BOMBARDMENT
SHIKAMA, T
SAKAI, Y
OKADA, M
JOURNAL OF NUCLEAR MATERIALS, 1987, 150 (03) : 302 - 305
[5] Surface characterization of CuSn thin films deposited by RF co-sputtering method
Kang, Yujin
Park, Juyun
Kang, Yong-Cheol
SURFACE AND INTERFACE ANALYSIS, 2016, 48 (09) : 963 - 968
[6] Properties of Cd1-xZnxTe films deposited by magnetron co-sputtering
Wu, L.-L. (wulily77@163.com), 1600, Journal of Functional Materials (45):
[7] Optical and Electrical Properties of Indium Molybdenum Oxide Thin Films by the Co-Sputtering Method
Jeon, Jia
Oh, Gyujin
Kim, EunKyu
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2016, 16 (10) : 10970 - 10974
[8] Formation of Ti1-xSix and Ti1-xSixN films by magnetron co-sputtering
Musil, J
Jankovcová, H
Cibulka, V
CZECHOSLOVAK JOURNAL OF PHYSICS, 1999, 49 (03) : 359 - 372
[9] Structure and properties of molybdenum-disulfide/amorphous carbon composited coatings deposited by co-sputtering method
Dai, Wei
Li, Xu
Wu, Liang
Wang, Qimin
DIAMOND AND RELATED MATERIALS, 2020, 101
[10] Effect of Sputtering Current on Structure and Morphology of (Ti1-xCrx)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering
Paksunchai, C.
Denchitcharoen, S.
Chaiyakun, S.
Limsuwan, P.
ISEEC, 2012, 32 : 875 - 881

← 1 2 3 4 5 →