Thin film semiconductor deposition on free-standing ZnO columns

被引：189
|
作者：
Konenkamp, R.
Boedecker, K.
Lux-Steiner, M.C.
Poschenrieder, M.
Zenia, F.
Levy-Clement, C.
Wagner, S.
机构：
[1] Hahn-Meitner Institut Berlin, Glienicker Str. 100, 14109 Berlin, Germany
[2] Lab. Chim. Metallurgique Terres R., CNRS, 2-8 rue Henri Dunant, 94320 Thiais, France
[3] Department of Electrical Engineering, Princeton University, Princeton, NJ 08544, United States
来源：
| 2000年 / American Institute of Physics Inc.卷 / 77期
关键词：
D O I：
10.1063/1.1319187
中图分类号：
学科分类号：
摘要：
10
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