0. 25 mu m ELECTRON BEAM LITHOGRAPHY APPLIED TO GaAs DEVICES.

被引：0
|
作者：
Goodyear, A.
Vinton, D.J.
机构：
来源：
Annual Review - Philips Research Laboratories | 1986年
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
2
引用
收藏
页码：129 / 131
相关论文
共 50 条
  • [1] FLUX-STABILIZED SPECTRAL SOURCE OF WAVELENGTHS FROM 0. 25 TO 0. 5 mu m.
    Anzin, V.B.
    Tarasov, V.I.
    Instruments and experimental techniques New York, 1984, 27 (4 pt 2): : 955 - 956
  • [2] 0. 7 MICROMETER IDT FABRICATION FOR SAW DEVICES.
    Miyama, Hiroshi
    Nakamura, Michiko
    Kino, Yoshihiro
    Transactions of the Institute of Electronics and Communication Engineers of Japan. Section E, 1980, E63 (06): : 441 - 442
  • [3] TIME CONSTANTS OF 0. 3371 mu . DISHARGES INITIATED BY A GAS-LASER BEAM OF lambda equals 0. 3371 mu .
    Kurbatov, Yu.A.
    Tarasenko, V.F.
    1600, (02):
  • [4] ELECTRON-BEAM IMAGING AND METROLOGY OF 0.25-MU-M LITHOGRAPHY
    MONAHAN, KM
    SOLID STATE TECHNOLOGY, 1995, 38 (08) : 71 - &
  • [5] OPTICAL CONSTANTS OF PETROLEUM SAMPLES IN THE 0. 25-25 mu RANGE.
    Al'perovich, L.I.
    Komarova, A.I.
    Narziev, B.N.
    Pushkarev, V.N.
    1600, (28):
  • [6] A MONTE-CARLO SIMULATION OF ELECTRON-BEAM LITHOGRAPHY USED TO CREATE 0.5-MU-M STRUCTURES ON GAAS
    CUMMINGS, KD
    RESNICK, DJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2033 - 2036
  • [7] ADVANCED ELECTRON-BEAM LITHOGRAPHY FOR 0.5-MU-M TO 0.25-MU-M DEVICE FABRICATION
    HOHN, FJ
    WILSON, AD
    COANE, P
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (04) : 514 - 522
  • [8] INTEGRATED ELECTRON-BEAM LITHOGRAPHY FOR 0.25 MU-M DEVICE FABRICATION
    BUCCHIGNANO, J
    ROSENFIELD, M
    PEPPER, G
    DAVARI, B
    HOLM, F
    VISWANATHAN, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1827 - 1831
  • [9] ULTRALUMINOUS GALACTIC NUCLEI AT 12.5-MU-M, 0.''6
    KETO, E
    BALL, R
    MEIXNER, M
    IAU SYMPOSIA, 1991, (146): : 433 - 433
  • [10] 0. 67 mu m ROOM-TEMPERATURE OPERATION OF GaInAsP/AlGaAs LASERS ON GaAs PREPARED BY LPE.
    Kishino, Katsumi
    Koizumi, Yoshihiro
    Yokochi, Akira
    Kinoshita, Susumu
    Tako, Toshiharu
    Japanese Journal of Applied Physics, Part 2: Letters, 1984, 23 (9 pt 2): : 740 - 742
12345