Properties of plasma-deposited amorphous SiO2 films

被引：0
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作者：
He, Lenian [1 ]
机构：
[1] Zhejiang Univ, Hangzhou, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology | 2000年 / 20卷 / 04期
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摘要：
Amorphous films
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页码：247 / 251
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