Preparation of high quality transparent chemical vapor deposition diamond films by a DC arc plasma jet method

被引：8
|
作者：
Guofang, Zhong [1 ]
Fazheng, Shen [1 ]
Weizhong, Tang [1 ]
Fanxiu, Lu [1 ]
机构：
[1] School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China
来源：
| 1678年 / Elsevier Sequoia SA, Lausanne, Switzerland卷 / 09期
关键词：
Chamber pressure - Free standing - Process parameters - Substrate temperature - Supersaturated atomic hydrogen;
D O I：
10.1016/S0925-9635(00)00311-3
中图分类号：
学科分类号：
摘要：
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