High dose metal ion implantation

被引：0
|
作者：
Treglio, J.R. [1 ]
机构：
[1] ISM Technologies Inc, United States
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1989年 / B40-41卷 / pt 1期
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页码：567 / 570
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