Electroreflectance spectroscopy of strained Si1-xGex layers on silicon

被引：0
|
作者：
Ebner, T. [1 ]
Thonke, K. [1 ]
Sauer, R. [1 ]
Schaeffler, F. [1 ]
Herzog, H.J. [1 ]
机构：
[1] Universitaet Ulm, Ulm, Germany
来源：
Applied Surface Science | 1996年 / 102卷
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摘要：
15
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页码：90 / 93
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