Making a mark

被引：0
|
作者：
Glinsner, Thomas [1 ]
Luesebrink, Helge [1 ]
机构：
[1] EV Group
来源：
European Semiconductor | 2005年 / 27卷 / 02期
关键词：
Data storage equipment - Glass transition - Microprocessor chips - Optoelectronic devices - Reliability - Semiconductor device manufacture - Silicon wafers - Technology;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Nanoimprint lithography (NIL) which is being touted as a promising technology for the 32 nm node is discussed. It is estimated that there are currently 160 NIL systems in operation worldwide, mainly at universities and research and development centers. NIL is a replication method compared to the patterning approach of optical lithography tools. The template/stamp manufacturing depends on progress in advanced lithography technologies to provide the high-density fine pitch nano scale features.
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页码：27 / 29
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