Physical limits of superresolution lithography

被引：0
|
作者：
Hild, R. [1 ]
Nitzsche, G. [1 ]
Altenburger, U. [1 ]
机构：
[1] Friedrich-Schiller-Universitaet Jena, Jena, Germany
来源：
Optik (Jena) | 1994年 / 98卷 / 01期
关键词：
Degrees of freedom (mechanics) - Image processing - Lenses - Light - Optical filters - Optical resolving power - Projection systems;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
It can be shown, that it is not possible to increase the maximum transferable frequency in the aerial image of L/S-structures by superresolution methods. However an increase in contrast yields a resolution improvement. The DOF is sufficiently large. In addition it is not possible to apply these superresolution methods without any changes to the imaging of isolated structures. In this case it is most important to have optical filters with a narrow PSF.
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页码：39 / 43
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