ANODE SHEATH IN A STRONG TRANSVERSE MAGNETIC FIELD.

被引:0
|
作者
Chumenkov, V.P.
机构
来源
Soviet physics. Technical physics | 1979年 / 24卷 / 02期
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中图分类号
O441 [电磁学]; TM12 [];
学科分类号
0809 ;
摘要
The plasma sheath which arises at the anode in a discharge in a strong transverse magnetic field in which the gas is injected through the anode is investigated in the steady-state, one-dimensional formulation. The effect of the high-voltage boundary on the sheath structure is taken into account by introducing a potential-dependent electron mobility in the direction across the magnetic field. An approximate analytic solution is found by modeling the empirical behavior of the ion current density as a function of the potential over the sheath thickness. The solution depends only on a single function, the average number of ions generated by an electron that crosses a potential difference of 1 V. The distributions of various parameters over the sheath thickness are described.
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页码:169 / 173
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