Electric properties of Ni/n-PbTe and Ni/p-Pb0.5Sn0.5Te joined by plasma activated sintering

被引:0
|
作者
Orihashi, M. [1 ,4 ]
Noda, Y. [2 ]
Chen, L. [1 ]
Kang, Y.-S. [3 ]
Mono, A. [3 ]
Hirai, T. [1 ]
机构
[1] Institute for Materials Research, Tohoku University, 2-1-1, Sendai, Miyagi 980-8577, Japan
[2] Faculty of Science and Engineering, Shimane University, Matsue, Shimane 690-8504, Japan
[3] National Aerospace Laboratory, Kakuda Research Center, Kakuda, Miyagi 981-1525, Japan
[4] Japan Society for the Promotion of Science (JSPS Research Fellow)
来源
Materials Science Forum | 1999年 / 308-311卷
关键词
Bonding - Composition - Electric properties - Electric variables measurement - Electrodes - Energy gap - Interfaces (materials) - Plasma applications - Semiconductor junctions - Sintering - Thermoelectricity;
D O I
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中图分类号
学科分类号
摘要
In order to fabricate PbTe thermoelectric elements, Ni electrodes were joined with n-PbTe and p-Pb0.5Sn0.5Te by plasma activated sintering (PAS). The characterization of the Ni/n-PbTe and Ni/p-Pb0.5Sn0.5Te junctions was carried out by measuring voltage distribution around the joint boundary. No potential voltage gap was found at the interface of Ni/n-PbTe joint. In the case of Ni/p-Pb0.5Sn0.5Te joint, a large potential gap was found at the interface, where the intermediate layer with complicated composition was detected by EPMA. A buffer layer of p-SnTe was introduced into the Ni/p-Pb0.5Sn0.5Te joint to reduce the interface resistivity between Ni and p-Pb0.5Sn0.5Te. Low resistivity joint of metal/semiconductor was obtained by insertion of p-SnTe between Ni and p-Pb0.5Sn0.5Te.
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页码:675 / 680
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