Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry

被引：0
|
作者：
机构：
来源：
J Vac Sci Technol A | / 3 pt 2卷 / 1577期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry
    Pruette, LC
    Karecki, SM
    Reif, R
    Langan, JG
    Rogers, SA
    Ciotti, RJ
    Felker, BS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 1577 - 1581
  • [2] Evaluation of C4F8O as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry
    Pruette, L
    Karecki, S
    Reif, R
    Tousignant, L
    Reagan, W
    Kesari, S
    Zazzera, L
    ENVIRONMENTAL ISSUES IN THE ELECTRONICS AND SEMICONDUCTOR INDUSTRIES, 1999, 99 (08): : 20 - 29
  • [3] Evaluation of C4F8O as an alternative plasma-enhanced chemical vapor deposition chamber clean chemistry
    Pruette, L
    Karecki, S
    Reif, R
    Tousignant, L
    Reagan, W
    Kesari, S
    Zazzera, L
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (03) : 1149 - 1153
  • [4] Evaluation of octafluorocyclobutane as a chamber clean gas in a plasma-enhanced silicon dioxide chemical vapor deposition reactor
    Allgood, C
    Mocella, M
    Chae, HY
    Sawin, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (02) : G122 - G126
  • [5] Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System
    JangJian, Shiu-Ko
    Wang, Ying-Lang
    ACTIVE AND PASSIVE ELECTRONIC COMPONENTS, 2007, 2007
  • [6] On the Plasma Chemistry During Plasma Enhanced Chemical Vapor Deposition of Microcrystalline Silicon Oxides
    Gabriel, Onno
    Kirner, Simon
    Klingsporn, Max
    Friedrich, Felice
    Stannowski, Bernd
    Schlatmann, Rutger
    PLASMA PROCESSES AND POLYMERS, 2015, 12 (01) : 82 - 91
  • [7] Investigation of Plasma Enhanced Chemical Vapor Deposition Chamber Mismatching by Photoluminescence and Raman Spectroscopy
    Kim, Jung Geun
    Cho, Jik Ho
    Kim, Ryang Hyun
    Cho, Ki Sun
    Kang, Chun Ho
    Park, Sung Ki
    Ishigaki, Toshikazu
    Kang, Kitaek
    Yoo, Woo Sik
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2015, 4 (08) : P314 - P318
  • [8] Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas
    Sobolewski, MA
    Langan, JG
    Felker, BS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (01): : 173 - 182
  • [9] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    GRAVES, DB
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) : C38 - C38
  • [10] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    HESS, DW
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 9 - IAEC
12345