Particle deposition studies in acidic solutions

被引:0
|
作者
Knotter, D. Martin [1 ]
Dumesnil, Yolaine [2 ]
机构
[1] Philips Research Laboratories, Prof. Holstlaan 4 (WAG1), NL-5656 AA Eindhoven, Netherlands
[2] ISMRA, ENSI de Caen, 6 Bd Maréchal Juin, FR-14050 Caen Cedex 4, France
关键词
D O I
暂无
中图分类号
学科分类号
摘要
3
引用
收藏
页码:255 / 258
相关论文
共 50 条
  • [1] Particle deposition studies in acidic solutions
    Knotter, DM
    Dumesnil, Y
    ULTRA CLEAN PROCESSING OF SILICON SURFACES 2000, 2001, 76-77 : 255 - 258
  • [2] ELECTROCHEMICAL STUDIES OF LEAD DEPOSITION FROM ACIDIC AMMONIUM ACETATE SOLUTIONS ON DIFFERENT SUBSTRATES
    GIRGIS, M
    GHALI, E
    WIECKOWSKI, A
    ELECTROCHIMICA ACTA, 1986, 31 (06) : 681 - 689
  • [3] In situ kinetic studies of the chemical bath deposition of zinc sulfide from acidic solutions
    Bayer, A
    Boyle, DS
    O'Brien, P
    JOURNAL OF MATERIALS CHEMISTRY, 2002, 12 (10) : 2940 - 2944
  • [4] Kinetics of hydrogen underpotential deposition at ruthenium in acidic solutions
    Losiewicz, B.
    Martin, M.
    Lebouin, C.
    Lasia, A.
    JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2010, 649 (1-2) : 198 - 205
  • [5] Kinetics of hydrogen underpotential deposition at polycrystalline rhodium in acidic solutions
    Losiewicz, B.
    Jurczakowski, R.
    Lasia, A.
    ELECTROCHIMICA ACTA, 2011, 56 (16) : 5746 - 5753
  • [6] Electrochemical deposition of ZnO thin films from acidic solutions
    Fathy, Naglaa
    Ichimura, Masaya
    JOURNAL OF CRYSTAL GROWTH, 2006, 294 (02) : 191 - 196
  • [7] Kinetics of hydrogen underpotential deposition at polycrystalline platinum in acidic solutions
    Losiewicz, Bozena
    Jurczakowski, Rafal
    Lasia, Andrzej
    ELECTROCHIMICA ACTA, 2012, 80 : 292 - 301
  • [8] CYCLIC VOLTAMMETRY STUDIES OF COPPER (II) AND TELLURIUM (IV) IONS IN ACIDIC AQUEOUS SOLUTIONS FOR THIN FILM DEPOSITION
    Nagalingam, Saravanan
    Teh, Geok Bee
    SCIENTIFIC STUDY AND RESEARCH-CHEMISTRY AND CHEMICAL ENGINEERING BIOTECHNOLOGY FOOD INDUSTRY, 2014, 15 (01): : 1 - 7
  • [9] Particle deposition control for various wafer surfaces in acidic solution with surfactant
    Nose, M
    Itano, M
    Ohmi, T
    PARTICULATE SCIENCE AND TECHNOLOGY, 1996, 14 (01) : 27 - 41
  • [10] Electroless deposition of copper in acidic solutions using hypophosphite reducing agent
    R. Touir
    H. Larhzil
    M. EbnTouhami
    M. Cherkaoui
    E. Chassaing
    Journal of Applied Electrochemistry, 2006, 36 : 69 - 75