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- [1] IN-SITU MASS-SPECTRAL AND INFRARED STUDIES OF THE GAS-PHASE EVOLUTION AND DECOMPOSITION PATHWAYS OF CU-II(HFAC)(2) - APPLICATION IN THE DEVELOPMENT OF PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF COPPERJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (11) : 3896 - 3903ZHENG, BBRAECKELMANN, GKUJAWSKI, KLOU, ILANE, SKALOYEROS, AE
- [2] In situ measurement of gas-phase reactions in metal-organic chemical vapor deposition of copper films by Fourier transform infrared spectroscopyJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1993, 32 (10): : 4774 - 4778Hanaoka, Ken-ichiOhnishi, HiroshiTachibana, Kunihide
- [3] Molecular beam mass spectrometry studies of the gas-phase chemistry occurring during microwave plasma assisted chemical vapour deposition of diamondDIAMOND AND RELATED MATERIALS, 1999, 8 (8-9) : 1377 - 1382Leeds, SMMay, PWBartlett, EAshfold, MNRRosser, KN
- [4] Molecular beam mass spectrometry studies of the gas-phase chemistry occurring during microwave plasma assisted chemical vapour deposition of diamondDiamond and Related Materials, 1999, 8 (08): : 1377 - 1382Leeds, S.M.May, P.W.Bartlett, E.Ashfold, M.N.R.Rosser, K.N.
- [5] OPTICAL-EMISSION AND MASS SPECTROSCOPIC STUDIES OF THE GAS-PHASE DURING THE DEPOSITION OF SIO2 AND A-SI-H BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITIONJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 1115 - 1123TSU, DVPARSONS, GNLUCOVSKY, GWATKINS, MW
- [6] IN-SITU MEASUREMENT OF GAS-PHASE REACTIONS DURING THE METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION OF COPPER USING FOURIER-TRANSFORM INFRARED-SPECTROSCOPYTHIN SOLID FILMS, 1995, 262 (1-2) : 209 - 217HANAOKA, KTACHIBANA, KOHNISHI, H
- [7] IN-SITU MEASUREMENT OF GAS-PHASE REACTIONS IN METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION OF COPPER-FILMS BY FOURIER-TRANSFORM INFRARED-SPECTROSCOPYJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (10): : 4774 - 4778HANAOKA, KOHNISHI, HTACHIBANA, K