Vertical and smooth etching of InP by Cl2/Xe inductively coupled plasma

被引：0
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作者：
Matsutani, Akihiro [1 ]
Ohtsuki, Hideo [1 ]
Koyama, Fumio [1 ]
Iga, Kenichi [1 ]
机构：
[1] Tokyo Inst of Technology, Yokohama, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 7 A期
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页码：4260 / 4261
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